Issued Patents 2024
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12105433 | Imaging overlay targets using moiré elements and rotational symmetry arrangements | Mark Ghinovker, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2024-10-01 |
| 12094100 | Measurement of stitching error using split targets | Mark Ghinovker | 2024-09-17 |
| 12055859 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Eitan Hajaj, Ulrich Pohlmann +4 more | 2024-08-06 |
| 12013634 | Reduction or elimination of pattern placement error in metrology measurements | Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2024-06-18 |
| 11862522 | Accuracy improvements in optical metrology | Barak Bringoltz, Evgeni Gurevich, Ido Adam, Dror Alumot, Yuval Lamhot +6 more | 2024-01-02 |
| 11862524 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Mark Ghinovker, Eitan Hajaj, Ulrich Pohlmann +4 more | 2024-01-02 |