Issued Patents 2024
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12164277 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Franz Zach, Mark D. Smith | 2024-12-10 |
| 12153352 | System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target | Xuemei Chen | 2024-11-26 |
| 12013634 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2024-06-18 |