HK

Hirotomo Kawahara

AG Agc: 4 patents #11 of 232Top 5%
📍 Tokyo, CA: #58 of 249 inventorsTop 25%
Overall (2024): #52,060 of 561,600Top 10%
4
Patents 2024

Issued Patents 2024

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
12038685 Reflective mask blank for EUV lithography Hiroyoshi Tanabe, Toshiyuki Uno, Hiroshi Hanekawa, Daijiro AKAGI 2024-07-16
11982935 Reflective mask blank for EUV lithography Hiroshi Hanekawa, Toshiyuki Uno, Masafumi AKITA 2024-05-14
11953822 Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same Daijiro AKAGI, Hiroaki IWAOKA, Toshiyuki Uno, Michinori Suehara, Keishi TSUKIYAMA 2024-04-09
11934093 Reflective mask blank for EUV lithography and substrate with conductive film Yusuke Ono, Hiroshi Hanekawa 2024-03-19