Issued Patents 2023
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11829067 | Resist composition and patterning process | Jun Hatakeyama | 2023-11-28 |
| 11815814 | Iodized aromatic carboxylic acid type pendant-containing polymer, resist composition and patterning process | Jun Hatakeyama | 2023-11-14 |
| 11782343 | Resist composition and patterning process | Jun Hatakeyama | 2023-10-10 |
| 11773059 | Onium salt, chemically amplified negative resist composition, and pattern forming process | Naoya Inoue, Satoshi Watanabe, Ryosuke Taniguchi | 2023-10-03 |
| 11774853 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara, Kazuhiro Katayama | 2023-10-03 |
| 11762287 | Onium salt compound, chemically amplified resist composition and patterning process | Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi | 2023-09-19 |
| 11765978 | Acoustic wave device | Takashi Osawa | 2023-09-19 |
| 11720021 | Positive resist composition and patterning process | Jun Hatakeyama | 2023-08-08 |
| 11709427 | Positive resist composition and pattern forming process | Jun Hatakeyama | 2023-07-25 |
| 11703760 | Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process | Jun Hatakeyama | 2023-07-18 |
| 11687000 | Sulfonium compound, chemically amplified resist composition, and patterning process | Masaki Ohashi, Kazuhiro Katayama, Yuki Kera | 2023-06-27 |
| 11637232 | Acoustic wave device including Li2CO3 layer on piezoelectric substrate made of LiNbO3 or LiTaO3 | Takashi Osawa, Masaki TSUTSUMI | 2023-04-25 |
| 11560355 | Onium salt, chemically amplified resist composition, and patterning process | Masaki Ohashi, Kazuhiro Katayama | 2023-01-24 |