NP

Nag B. Patibandla

Applied Materials: 20 patents #3 of 1,729Top 1%
Overall (2023): #1,958 of 537,848Top 1%
20
Patents 2023

Issued Patents 2023

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
11851570 Anionic polishing pads formed by printing processes Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Yingdong Luo, Daniel Redfield +3 more 2023-12-26
11855241 LED device having blue photoluminescent material and red/green quantum dots Yingdong Luo, Lisong Xu, Sivapackia Ganapathiappan, Hou T. Ng, Byung Sung Kwak +1 more 2023-12-26
11843025 Methods for transfer of micro-devices Mingwei Zhu, Sivapackia Ganapathiappan, Boyi Fu, Hou T. Ng 2023-12-12
11826876 Hydrophilic and zeta potential tunable chemical mechanical polishing pads Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Ankit Vora, Daniel Redfield +3 more 2023-11-28
11802349 Method for depositing high quality PVD films Zihao Yang, Mingwei Zhu, Yong Cao, Shumao ZHANG, Zhebo Chen +3 more 2023-10-31
11794308 Printed chemical mechanical polishing pad having particles therein Kasiraman Krishnan, Periya Gopalan 2023-10-24
11798831 Method for substrate registration and anchoring in inkjet printing Daihua Zhang, Hou T. Ng, Sivapackia Ganapathiappan, Yingdong Luo, Kyuil Cho +1 more 2023-10-24
11788883 SNSPD with integrated aluminum nitride seed or waveguide layer Zihao Yang, Mingwei Zhu, Nir Yahav, Robert Jan Visser, Adi de la Zerda 2023-10-17
11778926 Method and apparatus for deposition of multilayer device with superconductive film Mingwei Zhu, Zihao Yang, Ludovic Godet, Yong Cao, Daniel Lee Diehl +1 more 2023-10-03
11739418 Method and apparatus for deposition of metal nitrides Mingwei Zhu, Zihao Yang, Ludovic Godet, Yong Cao, Daniel Lee Diehl +1 more 2023-08-29
11724362 Polishing pads produced by an additive manufacturing process Rajeev Bajaj, Daniel Redfield, Mahendra C. ORILALL, Boyi Fu, Aniruddh Jagdish Khanna +5 more 2023-08-15
11724314 Large area recoating for additive manufacturing Hou T. Ng, Daihua Zhang 2023-08-15
11685014 Formulations for advanced polishing pads Sivapackia Ganapathiappan, Ankit Vora, Boyi Fu, Venkat Hariharan, Mayu YAMAMURA +5 more 2023-06-27
11678589 Method of making high critical temperature metal nitride layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Shane Lavan +2 more 2023-06-13
11653576 SNSPD with integrated aluminum nitride seed or waveguide layer Zihao Yang, Mingwei Zhu, Nir Yahav, Robert Jan Visser, Adi de la Zerda 2023-05-16
11646397 Chelating agents for quantum dot precursor materials in color conversion layers for micro-LEDs Yingdong Luo, Daihua Zhang, Hou T. Ng, Sivapackia Ganapathiappan 2023-05-09
11638979 Additive manufacturing of polishing pads Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Rajeev Bajaj, Daniel Redfield +2 more 2023-05-02
11612978 Additive manufacturing of polishing pads Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Mayu YAMAMURA, Daniel Redfield +2 more 2023-03-28
11600761 High critical temperature metal nitride layer with oxide or oxynitride seed layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Shane Lavan +2 more 2023-03-07
11575071 Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices Mingwei Zhu, Rongjun Wang, Daniel Lee Diehl, Vivek Agrawal, Anantha K. Subramani 2023-02-07