Issued Patents 2022
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11525072 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | An-Hsuan Lee, Shen-Nan Lee, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao | 2022-12-13 |
| 11495471 | Slurry compositions for chemical mechanical planarization | An-Hsuan Lee, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao | 2022-11-08 |
| 11389928 | Method for conditioning polishing pad | Shen-Nan Lee, Te-Chien Hou, Teng-Chun Tsai, Chung-Wei Hsu | 2022-07-19 |
| 11267987 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Chun-Hung Liao, An-Hsuan Lee, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao | 2022-03-08 |