Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11525072 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao | 2022-12-13 |
| 11495471 | Slurry compositions for chemical mechanical planarization | Chun-Hung Liao, Chen-Hao Wu, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao | 2022-11-08 |
| 11267987 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai, Chen-Hao Wu, Huang-Lin Chao | 2022-03-08 |