Issued Patents 2022
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11531269 | Method for producing resist pattern coating composition with use of solvent replacement method | Shuhei Shigaki, Satoshi Takeda, Wataru SHIBAYAMA, Makoto Nakajima | 2022-12-20 |
| 11506980 | Resist underlayer film forming composition using a fluorene compound | Hikaru TOKUNAGA, Keisuke Hashimoto | 2022-11-22 |
| 11440985 | Underlayer film-forming composition for use in forming a microphase-separated pattern | Ryuta MIZUOCHI, Yasunobu Someya, Hiroyuki Wakayama | 2022-09-13 |
| 11385546 | Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms | Takafumi Endo, Hikaru TOKUNAGA, Keisuke Hashimoto | 2022-07-12 |
| 11372330 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | Takahiro Kishioka, Daisuke Maruyama | 2022-06-28 |
| 11300879 | Resist underlayer film forming composition containing triaryldiamine-containing novolac resin | Daigo Saito, Keisuke Hashimoto | 2022-04-12 |