MN

Makoto Nakajima

NI Nissan Chemical Industries: 5 patents #1 of 38Top 3%
SL Suntory Holdings Limited: 2 patents #5 of 61Top 9%
FU Fujifilm: 1 patents #331 of 664Top 50%
OU Osaka University: 1 patents #48 of 260Top 20%
TT The University Of Tokyo: 1 patents #55 of 326Top 20%
Samsung: 1 patents #7,077 of 17,243Top 45%
📍 Toyama, JP: #3 of 250 inventorsTop 2%
Overall (2022): #12,363 of 548,613Top 3%
8
Patents 2022

Issued Patents 2022

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
11531269 Method for producing resist pattern coating composition with use of solvent replacement method Shuhei Shigaki, Satoshi Takeda, Wataru SHIBAYAMA, Rikimaru Sakamoto 2022-12-20
11488824 Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development Satoshi Takeda, Yuta Kanno, Hiroyuki Wakayama 2022-11-01
11392037 Resist underlayer film forming composition containing silicone having cyclic amino group Wataru SHIBAYAMA, Yuta Kanno 2022-07-19
11315595 Recording method, recording device, reproduction method, reproduction device, and high-speed response element Shin-ichi Ohkoshi, Masashi Shirata, Hiroaki Doshita 2022-04-26
11284638 Beverage containing catechin compound(s) and RebD and/or RebM Yasuyuki Kobayashi 2022-03-29
11284630 Beverage containing tea polymerized polyphenol and RebD and/or RebM Yasuyuki Kobayashi 2022-03-29
11281104 Alkaline developer soluable silicon-containing resist underlayer film-forming composition Wataru SHIBAYAMA 2022-03-22
11215927 Substrate treating composition and method for fabricating a semiconductor device using the same Ju Young Kim, Hyunwoo KIM, Satoshi Takeda, Shuhei Shigaki, Wataru SHIBAYAMA 2022-01-04