Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11448973 | Computational metrology based correction and control | Manouk RIJPSTRA, Cornelis Johannes Henricus LAMBREGTS, Wim Tjibbo Tel, Sarathi ROY, Cédric Désiré Grouwstra +3 more | 2022-09-20 |
| 11327407 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Alexander Ypma, Marc Hauptmann, Michiel Kupers, Lydia Marianna Vergaij-Huizer, Erik Johannes Maria Wallerbos +8 more | 2022-05-10 |