Issued Patents 2021
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11193206 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | Matthew R. MacDonald, Moo-Sung Kim, Se Won Lee | 2021-12-07 |
| 11158498 | Silicon compounds and methods for depositing films using same | Robert Gordon Ridgeway, Jennifer Lynn Anne Achtyl, Raymond Nicholas Vrtis, William Robert Entley | 2021-10-26 |
| 11152206 | Compositions and methods using same for carbon doped silicon containing films | Haripin Chandra, Anupama Mallikarjunan, Moo-Sung Kim | 2021-10-19 |
| 11142658 | Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films | Daniel P. Spence, Ronald Martin Pearlstein, Manchao Xiao, Jianheng Li | 2021-10-12 |
| 11139162 | Organoaminosilane precursors and methods for depositing films comprising same | Mark Leonard O'Neill, Manchao Xiao, Richard Ho, Haripin Chandra, Matthew R. MacDonald +1 more | 2021-10-05 |
| 11104990 | Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films | Moo-Sung Kim, Jianheng Li | 2021-08-31 |
| 11098069 | Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films | Matthew R. MacDonald, Manchao Xiao, Meiliang Wang | 2021-08-24 |
| 11078569 | Trisilylamine derivatives as precursors for high growth rate silicon-containing films | Matthew R. MacDonald, Meiliang Wang | 2021-08-03 |
| 11081337 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | Matthew R. MacDonald, Moo-Sung Kim, Se Won Lee | 2021-08-03 |
| 11043374 | Silacycloalkane compounds and methods for depositing silicon containing films using same | Manchao Xiao, Robert Gordon Ridgeway, Daniel P. Spence, Raymond Nicholas Vrtis | 2021-06-22 |
| 11035039 | Compositions and methods for depositing silicon nitride films | Moo-Sung Kim, Manchao Xiao | 2021-06-15 |
| 11017998 | Precursors and flowable CVD methods for making low-K films to fill surface features | Jianheng Li, Raymond Nicholas Vrtis, Robert Gordon Ridgeway, Manchao Xiao | 2021-05-25 |
| 10991571 | High temperature atomic layer deposition of silicon oxide thin films | Haripin Chandra, Meiliang Wang, Manchao Xiao, Ronald Martin Pearlstein, Mark Leonard O'Neill | 2021-04-27 |
| 10985010 | Methods for making silicon and nitrogen containing films | Haripin Chandra, Moo-Sung Kim | 2021-04-20 |
| 10985013 | Method and precursors for manufacturing 3D devices | Jianheng Li, Robert Gordon Ridgeway, Raymond Nicholas Vrtis, Bing Han, Madhukar Bhaskara Rao | 2021-04-20 |
| 10914001 | Volatile dihydropyrazinly and dihydropyrazine metal complexes | John Anthony Thomas Norman, Sergei Vladimirovich Ivanov | 2021-02-09 |
| 10899500 | Alkoxysilylamine compounds and applications thereof | Manchao Xiao, Ronald Martin Pearlstein, Richard Ho, Daniel P. Spence | 2021-01-26 |