Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11067896 | Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay | Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Nelson Felix | 2021-07-20 |
| 11022890 | Photoresist bridging defect removal by reverse tone weak developer | Zhenxing Bi, Nicole Saulnier, Hao Tang | 2021-06-01 |
| 11022891 | Photoresist bridging defect removal by reverse tone weak developer | Zhenxing Bi, Nicole Saulnier, Hao Tang | 2021-06-01 |