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Resistivity-based adjustment of measurements from in-situ monitoring |
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| 11183435 |
Endpointing detection for chemical mechanical polishing based on spectrometry |
Dominic J. Benvegnu, Jeffrey Drue David |
2021-11-23 |
| 11100628 |
Thickness measurement of substrate using color metrology |
Nojan Motamedi, Dominic J. Benvegnu, Martin A. Josefowicz |
2021-08-24 |
| 11079459 |
Resistivity-based calibration of in-situ electromagnetic inductive monitoring |
Kun Xu, Ingemar Carlsson, Shih-Haur Shen, Tzu-Yu Liu |
2021-08-03 |
| 11004708 |
Core configuration with alternating posts for in-situ electromagnetic induction monitoring system |
Hassan G. Iravani, Tzu-Yu Liu, Kun Xu, Shih-Haur Shen |
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| 10994389 |
Polishing apparatus using neural network for monitoring |
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| 10948900 |
Display of spectra contour plots versus time for semiconductor processing system control |
Jeffrey Drue David, Harry Q. Lee, Dominic J. Benvegnu |
2021-03-16 |
