Issued Patents 2020
Showing 26–50 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10830906 | Method of adaptive weighting adjustment positioning | Wun-Sheng Yao, Yi-Yie Yan | 2020-11-10 |
| 10825892 | MIM capacitor with top electrode having footing profile and method forming same | Hung-Hao Chen, Wen-Tung Chen, Yu-Cheng Liu, Horng-Huei Tseng | 2020-11-03 |
| 10818794 | Semiconductor structure and fabricating method thereof | Tung-Wen Cheng, Chang-Yin Chen, Mu-Tsang Lin | 2020-10-27 |
| 10811506 | Self-aligned metal gate etch back process and device | Chih-Han Lin, Horng-Huei Tseng | 2020-10-20 |
| 10811538 | Semiconductor device with gate stack | Chih-Han Lin | 2020-10-20 |
| 10811536 | FinFET device and method of forming and monitoring quality of the same | Chang-Yin Chen, Chih-Han Lin, Horng-Huei Tseng | 2020-10-20 |
| 10811516 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Mu-Tsang Lin, Tung-Wen Cheng, Zhe Zhang | 2020-10-20 |
| 10811412 | Method of fabricating semiconductor device | Chih-Han Lin, Horng-Huei Tseng | 2020-10-20 |
| 10804396 | Embedded source or drain region of transistor with downward tapered region under facet region | Tung-Wen Cheng, Zhe Zhang, Yung-Jung Chang | 2020-10-13 |
| 10804371 | Structure and formation method of semiconductor device with gate stack | Sheng-Chi Shih, Yi-Jen Chen | 2020-10-13 |
| 10796955 | Fin field effect transistor (FinFET) device structure with interconnect structure | Chih-Han Lin | 2020-10-06 |
| 10797140 | Semiconductor device and method | Chih-Han Lin, Horng-Huei Tseng | 2020-10-06 |
| 10777419 | Semiconductor device with fin isolation and method of forming the same | Chang-Yin Chen, Chih-Han Lin | 2020-09-15 |
| 10763362 | Fin field effect transistor (FinFET) device structure with stop layer and method for forming the same | Chih-Han Lin | 2020-09-01 |
| 10763258 | Integrated circuit and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2020-09-01 |
| 10748912 | Method for semiconductor device fabrication with improved source drain proximity | Chih-Han Lin, Horng-Huei Tseng | 2020-08-18 |
| 10749014 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Jr-Jung Lin, Shih-Hao Chen, Chih-Han Lin, Mu-Tsang Lin, Yung-Jung Chang | 2020-08-18 |
| 10727178 | Via structure and methods thereof | Chih-Han Lin | 2020-07-28 |
| 10727227 | Fin-type field effect transistor structure and manufacturing method thereof | Chih-Han Lin | 2020-07-28 |
| 10727132 | Fin field effect transistor, semiconductor device and method for fabricating the same | Chih-Han Lin, Horng-Huei Tseng | 2020-07-28 |
| 10714581 | Semiconductor device and manufacturing method thereof | Chih-Han Lin | 2020-07-14 |
| 10714588 | Metal gate process for FinFET device improvement | Chih-Han Lin, Horng-Huei Tseng | 2020-07-14 |
| 10704917 | Image positioning method and image positioning device for using the same | Yi-Yie Yan, Wun-Sheng Yao | 2020-07-07 |
| 10700180 | Semiconductor structure and manufacturing method thereof | Chang-Yin Chen, Chih-Han Lin | 2020-06-30 |
| 10700208 | Semiconductor device and methods of manufacture | Kai Cheng, Chih-Han Lin, Sin-Yi Yang, Horng-Huei Tseng | 2020-06-30 |