Issued Patents 2020
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10867865 | Method and structure for FinFET isolation | Che-Cheng Chang, Chih-Han Lin | 2020-12-15 |
| 10854504 | Semiconductor structure and manufacturing method thereof | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2020-12-01 |
| 10854742 | Metal gate electrode of a semiconductor device | Chih-Han Lin, Jin-Aun Ng, Ming-Ching Chang, Chao-Cheng Chen | 2020-12-01 |
| 10749014 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Shih-Hao Chen, Chih-Han Lin, Mu-Tsang Lin, Yung-Jung Chang | 2020-08-18 |
| 10749007 | Gate structure with desired profile for semiconductor devices | Ricky Wang, Chao-Cheng Chen, Chi-Wei Yang | 2020-08-18 |
| 10692701 | Dry etching apparatus | Chang-Yin Chen, Tung-Wen Cheng, Che-Cheng Chang, Chih-Han Lin | 2020-06-23 |
| 10672796 | Mechanisms for forming FINFET device | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2020-06-02 |
| 10535758 | Gate structure of field effect transistor with footing | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2020-01-14 |