Issued Patents 2020
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879399 | Method of manufacturing semiconductor device comprising doped gate spacer | Wei-Yang Lo, Chia-Ling Chan, Mu-Tsang Lin | 2020-12-29 |
| 10868005 | FinFETs and methods of forming finFETs | Chih-Shan Chen, Wei-Yang Lo | 2020-12-15 |
| 10840378 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Chang-Yin Chen, Che-Cheng Chang, Yung-Jung Chang | 2020-11-17 |
| 10818794 | Semiconductor structure and fabricating method thereof | Che-Cheng Chang, Chang-Yin Chen, Mu-Tsang Lin | 2020-10-27 |
| 10811516 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Che-Cheng Chang, Mu-Tsang Lin, Zhe Zhang | 2020-10-20 |
| 10804396 | Embedded source or drain region of transistor with downward tapered region under facet region | Che-Cheng Chang, Zhe Zhang, Yung-Jung Chang | 2020-10-13 |
| 10770569 | Semiconductor device | Wei-Yang Lo, Shih-Hao Chen, Mu-Tsang Lin | 2020-09-08 |
| 10730020 | Emulsification element and emulsification device | Su-En Wu, Yi-Chun Lin, Chung K. Chang | 2020-08-04 |
| 10692701 | Dry etching apparatus | Chang-Yin Chen, Che-Cheng Chang, Jr-Jung Lin, Chih-Han Lin | 2020-06-23 |
| 10686077 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Chang-Yin Chen, Che-Cheng Chang, Yung-Jung Chang | 2020-06-16 |
| 10665719 | FinFET device with asymmetrical drain/source feature | Wei-Yang Lo | 2020-05-26 |
| 10636788 | Semiconductor device and manufacturing method thereof | Chih-Shan Chen, Mu-Tsang Lin | 2020-04-28 |
| 10596529 | Rotary emulsification device structure | Su-En Wu | 2020-03-24 |
| 10546956 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Che-Cheng Chang, Yung-Jung Chang | 2020-01-28 |