Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10763142 | System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter | Juan Valdivia, Hua Xiang, Andrew D. Bailey, III, Yoko Yamaguchi, Qian Fu +1 more | 2020-09-01 |
| 10572697 | Method of etch model calibration using optical scatterometry | Ye Feng, Andrew D. Bailey, III, Mehmet Derya Tetiker, Saravanapriyan Sriraman, Yan Zhang +1 more | 2020-02-25 |