Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10651286 | High selectivity nitride removal process based on selective polymer deposition | Ravi K. Dasaka, Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura | 2020-05-12 |
| 10573526 | Method of charge controlled patterning during reactive ion etching | Sunit S. Mahajan, Bachir Dirahoui | 2020-02-25 |
| 10546743 | Advanced interconnect with air gap | John H. Zhang, Yann Mignot, Lawrence A. Clevenger, Carl Radens, Yiheng Xu +2 more | 2020-01-28 |