| 10770291 |
Methods and masks for line end formation for back end of line (BEOL) interconnects and structures resulting therefrom |
Richard E. Schenker |
2020-09-08 |
| 10678137 |
Multi-pass patterning using nonreflecting radiation lithography on an underlying grating |
Manish Chandhok, Todd R. Younkin, Sang Hun Lee |
2020-06-09 |
| 10636700 |
Metal via processing schemes with via critical dimension (CD) control for back end of line (BEOL) interconnects and the resulting structures |
Paul A. Nyhus, Mohit K. HARAN, Robert M. Bigwood, Deepak S. Rao, Alexander F. Kaplan |
2020-04-28 |
| 10607884 |
Gate aligned contact and method to fabricate same |
Oleg Golonzka, Swaminathan Sivakumar, Tahir Ghani |
2020-03-31 |
| 10600678 |
Self-aligned isotropic etch of pre-formed vias and plugs for back end of line (BEOL) interconnects |
Elliot N. Tan, Paul A. Nyhus, Swaminathan Sivakumar |
2020-03-24 |
| 10559529 |
Pitch division patterning approaches with increased overlay margin for back end of line (BEOL) interconnect fabrication and structures resulting therefrom |
Leonard P. GULER, Manish Chandhok, Paul A. Nyhus |
2020-02-11 |