Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10859914 | Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development | Naoya HATAKEYAMA, Michihiro SHIRAKAWA, Keita Kato, Keiyu OU | 2020-12-08 |
| 10852637 | Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film | Naoki Inoue, Naohiro TANGO, Kei Yamamoto, Michihiro SHIRAKAWA | 2020-12-01 |
| 10802399 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Ryo Nishio, Masafumi KOJIMA, Tomotaka Tsuchimura, Michihiro SHIRAKAWA, Keita Kato | 2020-10-13 |
| 10578968 | Pattern forming method, resist pattern, and process for producing electronic device | Kei Yamamoto, Naohiro TANGO, Naoki Inoue, Michihiro SHIRAKAWA | 2020-03-03 |