KO

Keiyu OU

FU Fujifilm: 2 patents #232 of 772Top 35%
Overall (2020): #152,027 of 565,922Top 30%
2
Patents 2020

Issued Patents 2020

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10859914 Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development Naoya HATAKEYAMA, Akiyoshi GOTO, Michihiro SHIRAKAWA, Keita Kato 2020-12-08
10649329 Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device Shohei Kataoka, Akinori Shibuya 2020-05-12