Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10684466 | Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement | Wouter Bernardus Johannes Hakvoort, Richard Petrus Hogervorst, Petrus Theodorus Rutgers, Kerstin Hild | 2020-06-16 |
| 10620543 | Method and device for the correction of imaging defects | Franz Sorg, Peter Deufel | 2020-04-14 |
| 10591825 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Johannes Ruoff, Norbert Wabra, Ricarda Schoemer +1 more | 2020-03-17 |
| 10578976 | Catadioptric projection objective including a reflective optical component and a measuring device | Sascha Bleidistel, Christoph Zaczek, Ralf Mueller | 2020-03-03 |