Issued Patents 2019
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522416 | FinFET device having oxide region between vertical fin structures | Kuo-Cheng Ching | 2019-12-31 |
| 10522407 | FinFET channel on oxide structures and related methods | Kuo-Cheng Ching, Ching-Wei Tsai | 2019-12-31 |
| 10516049 | Multi-gate device and method of fabrication thereof | Kuo-Cheng Ching, Ching-Wei Tsai, Carlos H. Diaz, Chih-Hao Wang, Wai-Yi Lien | 2019-12-24 |
| 10516051 | FinFET and method of fabrication thereof | Kuo-Cheng Ching, Kuan-Ting Pan, Ching-Wei Tsai, Chih-Hao Wang, Carlos H. Diaz | 2019-12-24 |
| 10505022 | Devices including gate spacer with gap or void and methods of forming the same | Kuo-Cheng Chiang, Ching-Wei Tsai, Chi-Wen Liu | 2019-12-10 |
| 10497792 | Contacts for highly scaled transistors | Carlos H. Diaz, Chung-Cheng Wu, Chia-Hao Chang, Chih-Hao Wang, Jean-Pierre Colinge +2 more | 2019-12-03 |
| 10431473 | FINFET with source/drain structure and method of fabrication thereof | Kuo-Cheng Ching, Ching-Wei Tsai, Chih-Hao Wang | 2019-10-01 |
| 10361126 | System and method for widening fin widths for small pitch FinFET devices | Kuo-Cheng Ching, Shi Ning Ju, Chih-Hao Wang, Carlos H. Diaz | 2019-07-23 |
| 10355137 | FINFETs with wrap-around silicide and method forming the same | Kuo-Cheng Ching, Ching-Wei Tsai, Chi-Wen Liu, Chih-Hao Wang | 2019-07-16 |
| 10170365 | Wrap around silicide for FinFETs | Kuo-Cheng Ching, Chi-Wen Liu | 2019-01-01 |