Issued Patents 2019
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522409 | Fin field effect transistor (FinFET) device structure with dummy fin structure and method for forming the same | Tzung-Yi Tsai, Yen-Ming Chen, Chih Chieh Yeh | 2019-12-31 |
| 10510887 | Method for fabricating a strained structure and structure formed | Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan, Jeff J. Xu | 2019-12-17 |
| 10483262 | Dual nitride stressor for semiconductor device and method of manufacturing | Yu-Lin Yang, Chia-Cheng Ho, Chih Chieh Yeh, Cheng-Yi Peng | 2019-11-19 |
| 10395937 | Fin patterning for semiconductor devices | Tzung-Yi Tsai, Yen-Ming Chen, Dian-Hau Chen, Han-Ting Tsai, Chia-Cheng Ho +1 more | 2019-08-27 |
| 10374059 | Structure and formation method of semiconductor device structure with nanowires | Chao-Ching Cheng, Wei-Sheng Yun, Shao-Ming Yu, Chih Chieh Yeh | 2019-08-06 |
| 10355108 | Method of forming a fin field effect transistor comprising two etching steps to define a fin structure | Feng Yuan, Hung-Ming Chen, Chang-Yun Chang, Clement Hsingjen Wann | 2019-07-16 |
| 10290550 | Strain enhancement for FinFETs | Chih Chieh Yeh, Feng Yuan, Hung-Li Chiang, Wei-Jen Lai | 2019-05-14 |