| 10509328 |
Fabrication and use of dose maps and feature size maps during substrate processing |
Joseph R. Johnson |
2019-12-17 |
| 10503076 |
Reserving spatial light modulator sections to address field non-uniformities |
Joseph R. Johnson, Thomas Laidig |
2019-12-10 |
| 10495975 |
Line edge roughness reduction via step size alteration |
Thomas Laidig, Joseph R. Johnson |
2019-12-03 |
| 10495979 |
Half tone scheme for maskless lithography |
Joseph R. Johnson, Thomas Laidig |
2019-12-03 |
| 10488762 |
Method to reduce data stream for spatial light modulator |
Joseph R. Johnson, Thomas Laidig |
2019-11-26 |
| 10490599 |
Collimated, directional micro-LED light field display |
Manivannan Thothadri, Robert Jan Visser, John M. White |
2019-11-26 |
| 10474041 |
Digital lithography with extended depth of focus |
Guoheng Zhao, Jeremy Nesbitt, Mehdi Vaez-Iravani |
2019-11-12 |
| 10416550 |
Method to reduce line waviness |
Joseph R. Johnson, Thomas Laidig |
2019-09-17 |
| 10394130 |
Quarter wave light splitting |
Joseph R. Johnson, Dave Markle, Mehdi Vaez-Iravani |
2019-08-27 |
| 10289003 |
Line edge roughness reduction via step size alteration |
Thomas Laidig, Joseph R. Johnson |
2019-05-14 |
| 10256382 |
Collimated OLED light field display |
John M. White, Manivannan Thothadri, Robert Jan Visser |
2019-04-09 |
