Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10459338 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Paul A. Nyhus, Eungnak Han, Ernisse Putna | 2019-10-29 |
| 10340185 | Gate aligned contact and method to fabricate same | Oleg Golonzka, Charles H. Wallace, Tahir Ghani | 2019-07-02 |
| 10325814 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Paul A. Nyhus | 2019-06-18 |
| 10211088 | Self-aligned isotropic etch of pre-formed vias and plugs for back end of line (BEOL) interconnects | Charles H. Wallace, Elliot N. Tan, Paul A. Nyhus | 2019-02-19 |
| 10204830 | Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects | Charles H. Wallace, Paul A. Nyhus, Elliot N. Tan | 2019-02-12 |