Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10514611 | Projection exposure method and projection exposure apparatus for microlithography | — | 2019-12-24 |
| 10310381 | Illumination system for EUV projection lithography | Ralf Mueller | 2019-06-04 |
| 10288894 | Optical component for use in a radiation source module of a projection exposure system | Alexander Wolf, Markus Schwab, Toralf Gruner, Joachim Hartjes | 2019-05-14 |
| 10216091 | Facet mirror for an illumination optical unit for projection lithography | Markus Deguenther | 2019-02-26 |
| 10191382 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Markus Deguenther, Michael Layh | 2019-01-29 |