Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2019-06-11 |
| 10289006 | Beam delivery for EUV lithography | Markus Franciscus Antonius Eurlings, Hermanus Johannes Maria Kreuwel | 2019-05-14 |
| 10248027 | Projection system | Hans Butler, Raoul Maarten Simon Knops, Bob Streefkerk, Christiaan Louis Valentin, Wilhelmus Franciscus Johannes Simons +4 more | 2019-04-02 |