HK

Hitoshi Kato

TL Tokyo Electron Limited: 7 patents #5 of 733Top 1%
Overall (2018): #14,764 of 503,207Top 3%
7
Patents 2018

Issued Patents 2018

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
10153131 Plasma processing apparatus and plasma processing method 2018-12-11
10151031 Method for processing a substrate and substrate processing apparatus Jun Sato, Masahiro Murata, Kentaro Oshimo, Tomoko Sugano, Shigehiro Miura 2018-12-11
10103009 Plasma processing device and operation method Shigehiro Miura, Jun Sato, Takeshi Kobayashi, Masato Yonezawa 2018-10-16
10072336 Film forming apparatus, film forming method, and recording medium Shigehiro Miura, Hiroyuki Kikuchi, Katsuyoshi Aikawa 2018-09-11
10026606 Method for depositing a silicon nitride film Yutaka Takahashi, Masahiro Murata 2018-07-17
9932674 Film deposition apparatus, film deposition method, and computer-readable recording medium Katsuyuki Hishiya, Hiroyuki Kikuchi, Shigehiro Ushikubo, Shigenori Ozaki 2018-04-03
9865454 Substrate processing apparatus and substrate processing method Hiroyuki Kikuchi, Masato Yonezawa, Jun Sato, Shigehiro Miura 2018-01-09