| 10037944 |
Self-aligned contact process enabled by low temperature |
Hong He, Chun-Chen Yeh, Yunpeng Yin |
2018-07-31 |
| 10020303 |
Methods for forming FinFETs having epitaxial Si S/D extensions with flat top surfaces on a SiGe seed layer |
Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin |
2018-07-10 |
| 9997367 |
Non-lithographic line pattern formation |
David V. Horak, Chun-Chen Yeh, Yunpeng Yin |
2018-06-12 |
| 9991258 |
FinFETs with non-merged epitaxial S/D extensions having a SiGe seed layer on insulator |
Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin |
2018-06-05 |
| 9991255 |
FinFETs with non-merged epitaxial S/D extensions on a seed layer and having flat top surfaces |
Hong He, Shogo Mochizuki, Chun-Chen Yeh, Yunpeng Yin |
2018-06-05 |
| 9985030 |
FinFET semiconductor device having integrated SiGe fin |
Kangguo Cheng, Hong He, Ali Khakifirooz, Chun-Chen Yeh, Yunpeng Yin |
2018-05-29 |
| 9947791 |
FinFET with merge-free fins |
Hong He, Junli Wang, Chun-Chen Yeh, Yunpeg Yin |
2018-04-17 |
| 9941191 |
Non-bridging contact via structures in proximity |
Jin Liu, Lei Zhuang |
2018-04-10 |
