Issued Patents 2018
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10103238 | Nanosheet field-effect transistor with full dielectric isolation | Hui Zang, Tek Po Rinus Lee, Ruilong Xie, Min Gyu Sung, Chanro Park | 2018-10-16 |
| 10090169 | Methods of forming integrated circuit structures including opening filled with insulator in metal gate | Hui Zang | 2018-10-02 |
| 10062772 | Preventing bridge formation between replacement gate and source/drain region through STI structure | Xusheng Wu, Xintuo Dai | 2018-08-28 |
| 10056458 | Siloxane and organic-based MOL contact patterning | Chang Ho Maeng, Andy Wei, Anthony Ozzello, Bharat Krishnan, Guillaume Bouche +9 more | 2018-08-21 |
| 10014298 | Method of forming field effect transistors with replacement metal gates and contacts and resulting structure | Hui Zang, Xiaofeng Qiu | 2018-07-03 |
| 9991361 | Methods for performing a gate cut last scheme for FinFET semiconductor devices | Xintuo Dai, Xusheng Wu | 2018-06-05 |
| 9991363 | Contact etch stop layer with sacrificial polysilicon layer | Jinsheng Gao, Haifeng Sheng, Jinping Liu, Huy Cao, Hui Zang | 2018-06-05 |
| 9966272 | Methods for nitride planarization using dielectric | Haifeng Sheng, Tai Fong Chao, Jiehui Shu, Jinping Liu, Xingzhao Shi +1 more | 2018-05-08 |
| 9935012 | Methods for forming different shapes in different regions of the same layer | Jinsheng Gao | 2018-04-03 |
| 9922972 | Embedded silicon carbide block patterning | Xiaofeng Qiu, Chang Ho Maeng | 2018-03-20 |
| 9916982 | Dielectric preservation in a replacement gate process | Xusheng Wu, John H. Zhang | 2018-03-13 |
| 9911736 | Method of forming field effect transistors with replacement metal gates and contacts and resulting structure | Hui Zang, Xiaofeng Qiu | 2018-03-06 |
| 9865543 | Structure and method for inhibiting cobalt diffusion | Qiang Fang, Stan Tsai, John H. Zhang, Xingzhao Shi, Tai Fong Chao | 2018-01-09 |