Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10001711 | Inspection method, lithographic apparatus, mask and substrate | Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen +1 more | 2018-06-19 |
| 9940427 | Lens heating aware source mask optimization for advanced lithography | Michael M. Crouse, Peng Liu, Hua-Yu Liu, Aiqin JIANG, Wenjin Huang | 2018-04-10 |