Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10073357 | Measuring a process parameter for a manufacturing process involving lithography | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Te-Chih Huang | 2018-09-11 |
| 10061212 | Metrology target, method and apparatus, target design method, computer program and lithographic system | Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos | 2018-08-28 |
| 10007744 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Eric Kent, Yen-Wen Lu, Paul Anthony Tuffy +3 more | 2018-06-26 |