Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10162271 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan | 2018-12-25 |
| 9946167 | Metrology method and inspection apparatus, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Arno Jan Bleeker, Willem Marie Julia Marcel Coene, Michael Kubis | 2018-04-17 |
| 9869940 | Metrology method and apparatus, computer program and lithographic system | Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer +1 more | 2018-01-16 |