Issued Patents 2017
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9768261 | Semiconductor structure and method of forming the same | Yi-Hsien Lee, Wei-Ming You, Ting-Chun Wang | 2017-09-19 |
| 9728646 | Flat STI surface for gate oxide uniformity in Fin FET devices | Shiu-Ko JangJian, Cheng-Wei Chen, Ting-Chun Wang | 2017-08-08 |
| 9716090 | FinFet structure | Cheng-Wei Chen, Hong-Yi Wu, Shiu-Ko JangJian, Wei-Ming You, Ting-Chun Wang | 2017-07-25 |
| 9697989 | Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method | Tsung-Han Wu, Yao-Wen Hsu, Lun-Kuang Tan, Wei-Ming You, Ting-Chun Wang | 2017-07-04 |
| 9679980 | Common source oxide formation by in-situ steam oxidation for embedded flash | Yu-Hung Cheng, Yeur-Luen Tu, Chia-Shiung Tsai, Ru-Liang Lee, I-Ting Li +1 more | 2017-06-13 |
| 9666692 | Method of forming FinFET gate oxide | Ting-Chun Wang, Yuan Chen | 2017-05-30 |
| 9659981 | Backside illuminated image sensor with negatively charged layer | Shyh-Fann Ting, Chih-Yu Lai, Yeur-Luen Tu, Ching-Chun Wang | 2017-05-23 |
| 9634096 | Semiconductor device with trench isolation | Yu-Hung Cheng, Yeur-Luen Tu, Chia-Shiung Tsai, Ru-Liang Lee, Tung-I Lin +1 more | 2017-04-25 |
| 9595589 | Transistor with performance boost by epitaxial layer | Yu-Hung Cheng, Yeur-Luen Tu, Chia-Shiung Tsai, Ru-Liang Lee, Tung-I Lin +1 more | 2017-03-14 |
| 9589804 | Method of forming finFET gate oxide | Shiu-Ko JangJian, Chung-Ren Sun, Ming-Te Chen, Ting-Chun Wang, Jun Cheng | 2017-03-07 |
| 9577102 | Method of forming gate and finFET | Yu-Ting Hsiao, Lun-Kuang Tan, Liang-Yu Yen, Ting-Chun Wang, Tsung-Han Wu +1 more | 2017-02-21 |
| 9570557 | Tilt implantation for STI formation in FinFET structures | Chen Cheng Chou, Chung-Ren Sun, Chii-Ming Wu, Tzu kai Lin | 2017-02-14 |