Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9644271 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama +2 more | 2017-05-09 |
| 9589799 | High selectivity and low stress carbon hardmask by pulsed low frequency RF power | Sirish Reddy, Xinyi Chen, Pramod Subramonium | 2017-03-07 |