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Methods and systems for advanced ion control for etching processes |
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Electrostatic chuck with thermal choke |
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Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication |
Zhongkui Tan, Qian Fu, Qing Xu |
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Systems and methods for reverse pulsing |
Maolin Long, Zhongkui Tan, Qian Fu, Alex Paterson, John Drewery |
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Methods and systems for plasma etching using bi-modal process gas composition responsive to plasma power level |
Zhongkui Tan, Qian Fu, Qing Xu |
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Systems and methods for reverse pulsing |
Maolin Long, Zhongkui Tan, Qian Fu, Alex Paterson, John Drewery |
2017-02-28 |