Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9852924 | Line edge roughness improvement with sidewall sputtering | Hua Xiang, Yiting Zhang, Qian Fu, Qing Xu | 2017-12-26 |
| 9824896 | Methods and systems for advanced ion control for etching processes | Qian Fu, Ying Wu, Qing Xu, John Drewery | 2017-11-21 |
| 9767991 | Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication | Qian Fu, Ying Wu, Qing Xu | 2017-09-19 |
| 9761459 | Systems and methods for reverse pulsing | Maolin Long, Ying Wu, Qian Fu, Alex Paterson, John Drewery | 2017-09-12 |
| 9691625 | Methods and systems for plasma etching using bi-modal process gas composition responsive to plasma power level | Qian Fu, Ying Wu, Qing Xu | 2017-06-27 |
| 9633867 | Method and apparatus for anisotropic tungsten etching | Qian Fu, Huai-Yu Hsiao | 2017-04-25 |
| 9583357 | Systems and methods for reverse pulsing | Maolin Long, Ying Wu, Qian Fu, Alex Paterson, John Drewery | 2017-02-28 |