Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9806078 | FinFET spacer formation on gate sidewalls, between the channel and source/drain regions | Ruilong Xie, Tenko Yamashita, Balasubramanian Pranatharthiharan, Pietro Montanini, Soon-Cheon Seo | 2017-10-31 |
| 9685384 | Devices and methods of forming epi for aggressive gate pitch | Ruilong Xie, Soon-Cheon Seo, Balasubramanian Pranatharthiharan, Pietro Montanini, Shogo Mochizuki | 2017-06-20 |
| 9640533 | Methods, apparatus and system for providing source-drain epitaxy layer with lateral over-growth suppression | Kwan-Yong Lim | 2017-05-02 |