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Etch stop in a dep-etch-dep process |
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Integrated circuit with replacement gate stacks and method of forming same |
Unoh Kwon, Huihang Dong, John A. Fitzsimmons |
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Semiconductor device having a gate stack with tunable work function |
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Alternative threshold voltage scheme via direct metal gate patterning for high performance CMOS FinFETs |
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2017-01-24 |
