Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9829796 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Hiroo Takizawa, Takuya TSURUTA | 2017-11-28 |
| 9798234 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | Shuhei Yamaguchi, Natsumi Yokokawa | 2017-10-24 |
| 9718901 | Resin composition and pattern forming method using the same | Takuya TSURUTA, Kaoru Iwato | 2017-08-01 |
| 9632410 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | Shuhei Yamaguchi, Toru Tsuchihashi | 2017-04-25 |
| 9625813 | Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound | Tadateru Yatsuo | 2017-04-18 |
| 9563121 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | Takeshi Inasaki, Takeshi Kawabata, Toru Tsuchihashi | 2017-02-07 |
| 9557643 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | Hiroo Takizawa, Takeshi Kawabata, Takuya TSURUTA | 2017-01-31 |