Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9829796 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Hiroo Takizawa, Tomotaka Tsuchimura | 2017-11-28 |
| 9718901 | Resin composition and pattern forming method using the same | Tomotaka Tsuchimura, Kaoru Iwato | 2017-08-01 |
| 9557643 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | Hiroo Takizawa, Tomotaka Tsuchimura, Takeshi Kawabata | 2017-01-31 |