Issued Patents 2017
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9842744 | Methods for etch of SiN films | Jingchun Zhang, Nitin K. Ingle | 2017-12-12 |
| 9837284 | Oxide etch selectivity enhancement | Zhijun Chen, Nitin K. Ingle | 2017-12-05 |
| 9831097 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Nitin K. Ingle, Zihui Li, Mikhail Korolik | 2017-11-28 |
| 9768034 | Removal methods for high aspect ratio structures | Lin Xu, Zhijun Chen, Jiayin Huang | 2017-09-19 |
| 9754800 | Selective etch for silicon films | Jingchun Zhang, Nitin K. Ingle | 2017-09-05 |
| 9704723 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2017-07-11 |
| 9659791 | Metal removal with reduced surface roughness | Xikun Wang, David Cui, Nitin K. Ingle | 2017-05-23 |
| 9659792 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2017-05-23 |
| 9653310 | Methods for selective etching of a silicon material | Zihui Li, Xing-Fu Zhong, Nitin K. Ingle | 2017-05-16 |
| 9613822 | Oxide etch selectivity enhancement | Zhijun Chen, Nitin K. Ingle | 2017-04-04 |
| 9607856 | Selective titanium nitride removal | Xikun Wang, Nitin K. Ingle, Dmitry Lubomirsky | 2017-03-28 |
| 9576815 | Gas-phase silicon nitride selective etch | Jingjing Xu, Fei Wang, Nitin K. Ingle, Robert Jan Visser | 2017-02-21 |
| 9576809 | Etch suppression with germanium | Mikhail Korolik, Nitin K. Ingle, Jingchun Zhang, Jie Liu | 2017-02-21 |
| 9576788 | Cleaning high aspect ratio vias | Jie Liu, Seung Ho Park, Zhenjiang Cui, Nitin K. Ingle | 2017-02-21 |
| 9564341 | Gas-phase silicon oxide selective etch | Jingjing Xu, Nitin K. Ingle | 2017-02-07 |
| 9553102 | Tungsten separation | Xikun Wang, Jie Liu, Nitin K. Ingle | 2017-01-24 |