| 9783558 |
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films |
Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen |
2017-10-10 |
| 9630895 |
Storage and stabilization of acetylene |
Edward A. Sturm, J. Donald Carruthers |
2017-04-25 |
| 9631778 |
Endpoint determination for capillary-assisted flow control |
Joseph D. Sweeney, Anthony M. Avila, Michael J. Wodjenski, Joseph R. Despres |
2017-04-25 |
| 9586188 |
Fluid processing systems and methods |
Steven M. Lurcott, John E. Q. Hughes, Peter Wrschka, Donald D. Ware, Peng Zou |
2017-03-07 |
| 9534285 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films |
Chongying Xu, Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder |
2017-01-03 |
| 9537095 |
Tellurium compounds useful for deposition of tellurium containing materials |
Matthias Stender, Chongying Xu, Tianniu Chen, William Hunks, Philip S. H. Chen +1 more |
2017-01-03 |