Issued Patents 2016
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9472412 | Procedure for etch rate consistency | Hanshen Zhang | 2016-10-18 |
| 9449845 | Selective titanium nitride etching | Jie Liu, Anchuan Wang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2016-09-20 |
| 9437451 | Radical-component oxide etch | Zhijun Chen, Ching-Mei Hsu, Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2016-09-06 |
| 9418858 | Selective etch of silicon by way of metastable hydrogen termination | Anchuan Wang, Nitin K. Ingle, Young S. Lee | 2016-08-16 |
| 9390937 | Silicon-carbon-nitride selective etch | Zhijun Chen, Anchuan Wang, Nitin K. Ingle | 2016-07-12 |
| 9343327 | Methods for etch of sin films | Anchuan Wang, Nitin K. Ingle | 2016-05-17 |
| 9324576 | Selective etch for silicon films | Anchuan Wang, Nitin K. Ingle | 2016-04-26 |
| 9245762 | Procedure for etch rate consistency | Hanshen Zhang | 2016-01-26 |
| 9236266 | Dry-etch for silicon-and-carbon-containing films | Anchuan Wang, Nitin K. Ingle, Yunyu Wang, Young S. Lee | 2016-01-12 |