Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9500945 | Pattern classification based proximity corrections for reticle fabrication | Chin Teong Lim, Paul Ackmann, Christian Buergel | 2016-11-22 |
| 9384318 | Mask error compensation by optical modeling calibration | Paul Ackmann, Chin Teong Lim | 2016-07-05 |
| 9368453 | Overlay mark dependent dummy fill to mitigate gate height variation | Chan Seob Cho, Paul Ackmann, Jung-Yu Hsieh, Hui Peng Koh | 2016-06-14 |
| 9329471 | Achieving a critical dimension target based on resist characteristics | Xintuo Dai, Huang Liu, Chin Teong Lim | 2016-05-03 |
| 9323882 | Metrology pattern layout and method of use thereof | Guido Ueberreiter, Lloyd C. Litt, Paul Ackmann | 2016-04-26 |
| 9252061 | Overlay mark dependent dummy fill to mitigate gate height variation | Chan Seob Cho, Paul Ackmann, Jung-Yu Hsieh, Hui Peng Koh | 2016-02-02 |
| 9250538 | Efficient optical proximity correction repair flow method and apparatus | Christopher A. Spence, Paul Ackmann, Chin Teong Lim | 2016-02-02 |
| 9236301 | Customized alleviation of stresses generated by through-substrate via(S) | Xiang Hu, Paul Ackmann, Sarasvathi Thangaraju | 2016-01-12 |