Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9500945 | Pattern classification based proximity corrections for reticle fabrication | Guoxiang Ning, Chin Teong Lim, Paul Ackmann | 2016-11-22 |
| 9405185 | Shape metrology for photomasks | Clemens Utzny, Markus Bender, Albrecht Ullrich | 2016-08-02 |