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Low degradation MRAM encapsulation process using silicon-rich silicon nitride film |
Anthony J. Annunziata, Chandrasekaran Kothandaraman, Gen P. Lauer, Junghyuk Lee, Nathan P. Marchack +2 more |
2016-12-06 |
| 9484248 |
Patternable dielectric film structure with improved lithography and method of fabricating same |
Qinghuang Lin |
2016-11-01 |
| 9484403 |
Boron rich nitride cap for total ionizing dose mitigation in SOI devices |
Alfred Grill, Kenneth P. Rodbell |
2016-11-01 |
| 9472450 |
Graphene cap for copper interconnect structures |
Griselda Bonilla, Christos D. Dimitrakopoulos, Alfred Grill, James B. Hannon, Qinghuang Lin +3 more |
2016-10-18 |
| 9418846 |
Selective dopant junction for a group III-V semiconductor device |
Kevin K. Chan, Marinus Hopstaken, Young-Hee Kim, Masaharu Kobayashi, Effendi Leobandung +3 more |
2016-08-16 |
| 9293557 |
Low temperature spacer for advanced semiconductor devices |
Kevin K. Chan, Alfred Grill, Dae-Gyu Park, Norma E. Sosa, Min Yang |
2016-03-22 |
| 9231063 |
Boron rich nitride cap for total ionizing dose mitigation in SOI devices |
Alfred Grill, Kenneth P. Rodbell |
2016-01-05 |
