Issued Patents 2016
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9527809 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | Natsumi Yokokawa, Hiroo Takizawa, Shuji Hirano, Wataru Nihashi | 2016-12-27 |
| 9500951 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | Natsumi Yokokawa, Hiroo Takizawa | 2016-11-22 |
| 9470980 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | Naoki Inoue, Hiroo Takizawa, Shuji Hirano | 2016-10-18 |
| 9465298 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | Shinichi Kanna | 2016-10-11 |
| 9458343 | Method of forming patterns | — | 2016-10-04 |
| 9448477 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device | Takeshi Kawabata, Hiroo Takizawa | 2016-09-20 |
| 9411230 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | Hiroo Takizawa, Kaoru Iwato | 2016-08-09 |
| 9323153 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | Shuji Hirano, Hiroo Takizawa | 2016-04-26 |
| 9323150 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | Shuji Hirano, Hiroo Takizawa | 2016-04-26 |
| 9291904 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | Shinichi Kanna | 2016-03-22 |