| 9470980 |
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device |
Hiroo Takizawa, Shuji Hirano, Hideaki Tsubaki |
2016-10-18 |
| 9464352 |
Low-oxidation plasma-assisted process |
Ryu Nakano, Kunitoshi Namba |
2016-10-11 |
| 9411243 |
Image forming apparatus having detachably mountable image forming unit |
Koichi Suzuki, Yoshitaka Hibi, Hironori Kato |
2016-08-09 |
| 9387999 |
Sheet feeding device and image forming apparatus |
Atsushi Murakami, Daisuke Aoki, Yu Shuhama |
2016-07-12 |
| 9343308 |
Method for trimming carbon-containing film at reduced trimming rate |
Yoshihiro Isii, Ryu Nakano |
2016-05-17 |
| 9343223 |
Reactor |
Kotaro Suzuki, Ryo Nakatsu, Kensuke Maeno |
2016-05-17 |
| 9306494 |
Oscillation device, scanning-type scanner device, information terminal, phase-shift amount adjustment device, and phase-shift amount adjustment method |
Ryusuke Horibe, Manabu Murayama |
2016-04-05 |
| 9284642 |
Method for forming oxide film by plasma-assisted processing |
Ryu Nakano |
2016-03-15 |
